Mergefrom Etch techniques date January 2010 For other uses of etch or etching , see Etching disambiguation ... right thumb The Soldier and his Wife. Etching by Daniel Hopfer , who is believed to have been the first to apply the technique to printmaking Etching is the process of using strong acid or mordant ... copper etching plate above, example of the print below, with composition reversed. In pure etching ... off the ground with a pointed etching needle ref http expositions.bnf.fr bosse grand 207.htm ref where ... the whole process this creates an etching which exists in more than one State printmaking state . Etching has often been combined with other Intaglio sculpture intaglio techniques such as engraving ... thumb left Christ Preaching , known as The Hundred Guilder print etching c1648 by Rembrandt . Main ... plates from the British Museum Etching by goldsmith s and other metal workers in order to decorate ... of etching as a printmaking technique. The process as applied to printmaking is believed to have ... in various media. The switch to copper plates was probably made in Italy, and thereafter etching soon ... was that, unlike engraving which requires special skill in metalworking, etching is relatively ... technical advances in etching technique. He developed the choppe, a type of etching needle with a slanting ... were able to do. Image G rtnerin mit Korb Belange .jpg thumb right Etching by Jacques Bellange , Gardener with basket c1612 He also seems to have been responsible for an improved, harder, recipe for the etching ... Abraham Bosse , spread Callot s innovations all over Europe with the first published manual of etching ... of etching, with Rembrandt , Giovanni Benedetto Castiglione and many other masters. In the 18th Piranesi ... etchers. In the 19th and early 20th century the Etching revival produced a host of lesser artists, but no really major figures. Etching is still widely practiced today. Variants aquatint, soft ground and relief etching File America a Prophecy copy a plate 01.jpg thumb Relief etching by William ... more details
wiktionary etchingEtching may refer to Etching , a printmaking technique in art Etching glass , a glass decoration technique Industrial etchingEtching microfabrication , a process in producing microelectronics Note that all of the above can be called chemical etching , though the term is mostly used for industrial etching. An etcher is most likely to mean a printmaker. An etchant sometimes mordant is any chemical used to etch, but probably refers to an industrial process. See also Etch disambiguation disambig sv Etsning ... more details
Other uses Etching disambiguation Unreferenced date December 2009 In semiconductor technology isotropic etching is non directional removal of material from a substrate via a chemical process using an Etching microfabrication etchant substance. The etchant may be a corrosive liquid or a chemically active ionized gas, known as a Plasma physics plasma . Isotropic etching is most easily understood by comparison to anisotropic or non isotropic etching. The most important commercial application of anisotropic etching is in semiconductor chip processing, where photolithography is used to print resist lines on silicon wafer electronics wafer s. To adequately reproduce very tiny lines below 0.1 micrometer into underlying silicon and metal layers on a wafer held in the horizontal plane, the direction of etching must be vertical only. The etchant may not be permitted to spread in the horizontal plane. Isotropic etching may occur unavoidably, or it may be desirable for process reasons. DEFAULTSORT Isotropic Etching Category Semiconductors ... more details
Wet etching may refer to Industrial etchingEtching microfabrication disambig Short pages monitor This long comment was added to the page to prevent it being listed on Special Shortpages. It and the accompanying monitoring template were generated via Template Longcomment. Please do not remove the monitor template without removing the comment as well. ... more details
Dry etching refers to the removal of material, typically a masked pattern of semiconductor material, by exposing the material to a bombardment of ions usually a plasma physics plasma of reactive gases such as fluorocarbons , oxygen , chlorine , boron trichloride sometimes with addition of nitrogen , argon , helium and other gases that dislodge portions of the material from the exposed surface. Unlike with many but not all, see isotropic etching of the wet chemical etchants used in wet etching , the dry etching process typically etches directionally or anisotropically. Explanation Dry etching is used in conjunction with photolithography photolithographic techniques to attack certain areas of a semiconductor surface in order to form recesses in material, such as contact hole s which are contacts to the underlying semiconductor substrate or via hole s which are holes that are formed to provide an interconnect path between conductive layers in the layered semiconductor device or to otherwise remove portions of semiconductor layers where predominantly vertical sides are desired. In conjunction with semiconductor manufacturing, Microelectromechanical systems micromachining and display production the removal of organic residues by oxygen plasmas is sometimes correctly described as a dry etch process. However, also the term plasma ashing may be used. Dry etching is particularly useful for materials and semiconductors which are chemically resistant and could not be wet etched, such as Silicon Carbide silicon carbide or Gallium Nitride gallium nitride References Dry etching is currently ... etching removal of material to create a High Aspect Ratio Structures eg deep via holes or capacitor trenches . The dry etching hardware design basically involve a vacuum chamber , special gas delivery system, RF waveform generator and an exhaust system. See also Plasma etcher Etching microfabrication chem stub Category Semiconductor device fabrication Category Microtechnology Category Etching ... more details
Unreferenced date December 2009 The Etching Revival is the name given by at the time, and by art historians, to the renaissance of etching as an original form of printmaking during a period of time stretching approximately from 1850 to 1930. Historical outline During the century after Rembrandt s death the techniques of etching and drypoint brought to their highest point by him gradually declined. By the late eighteenth century, with brilliant exceptions like Piranesi and Giovanni Battista Tiepolo Tiepolo , most etchings were reproductive or illustrative. However, in the 1840s and 50 s in France .... Three people were of special importance to the French Etching Revival the publisher Cadart , the printer Auguste Delatre and Maxime Lalanne , an etcher who wrote a popular textbook of etching in 1866. A Treatise on Etching by Lalanne was translated by S.R. Koehler and published in the United States in 1880. It played a significant role in the Etching Revival in America. However, before the translation of Lalanne s book, Philip Gilbert Hamerton had become an enthiusiastic promoter of etching in Britain. His Etching and Etchers 1868 was more an art history than a technical text but it did ... of the British Etching Revival was Francis Seymour Haden , the surgeon etcher, who, with his brother ... starting around 1860 that still stands as one the highpoints of etching history. Haden was a collector ..., did much to validate etching as an art form. Very soon, French etching would show the same modernist signs that French art showed generally, while English and American etching remained true to the kind ... the important figures at the turn of the century, and the New York Etching Club was formed as the primary professional etching organization. The next generation of etchers are too numerous to name ... Lewis and John Taylor Arms in the United States. Fall in popularity Etching as a collected and therefore ... of the stream of 19th and 20th century art. DEFAULTSORT Etching Revival Category Printmaking Category ... more details
Weasel date September 2008 VIN etching is a countermeasure to motor vehicle theft . It most commonly involves the use of a stencil and glass etching paste to etch a vehicle s vehicle identification number VIN onto the windshield and windows. Thieves would need to replace the glass before selling the stolen vehicle, thus reducing or eliminating their profit. ref http culpepersheriffsoffice.com programs vin etching Culpeper County Sheriff s Office VIN Etching ref VIN etching can increase the odds of recovery of car by police. ref http www.lehigh.edu inlpd vin.html Lehigh University Police Department VIN Etching Program, retrieved May 4, 2010 ref According to Allstate Allstate Insurance , most parts on a vehicle have at least a partial VIN stamped onto them, and many auto parts buyers will not buy parts that have identification numbers. Should a thief try to sell the parts from a vehicle for profit, those stamped parts carry a higher risk for both the thief and the auto parts seller. Since the glass has no identification number, and is often readily interchangeable with many different years and models of vehicle, there is often a much greater profit for the thief compared to other components on the vehicle. VIN Etching is recommended by police and Farmers insurance agencies. ref http www.allstate.com content refresh attachments VIN Etching Fact Sheet.pdf ref Notes Reflist CarDesign nav Category Car theft automotive tech stub ... more details
The Etching Club was an artists society founded in London , England in 1838 by Charles West Cope . The club published illustrated editions of works by authors such as Oliver Goldsmith , Shakespeare , John Milton and Thomas Gray . It effectively ceased to exist in 1878. ref Lang, p. 39. ref Membership colbegin Charles West Cope 1811 1890 William Holman Hunt Richard Redgrave 1804 1888 Samuel Palmer Thomas Creswick John Frederick Tayler 1806 1889 Henry James Townsend 1810 1890 John Callcott Horsley Thomas Webster painter Thomas Webster Frank Stone Samuel Palmer James Clarke Hook Richard Ansdell William Edward Frost George B. O Neill William Henry Hunt painter William Henry Hunt John Everett Millais Francis Seymour Haden Thomas Oldham Barlow colend Publications of The Etching Club Oliver Goldsmith . http www.archive.org details desertedvillage00golduoft The Deserted Village Joseph Cundall, 1855 first pub. 1841 . Oliver Goldsmith . The Vicar of Wakefield . Corney, B. Oliver Goldsmith Goldsmith s poetical works 1845 . William Shakespeare . Songs of Shakespeare 1843 . William Shakespeare . The Ballads of Shakespeare 1852 . John Milton . L Allegro and Il ponseroso 1849 . Thomas Gray . http books.google.com books?id 0C8BAAAAQAAJ&printsec frontcover&dq 22The etching club 22&lr &as brr 3&cd 26 v onepage&q&f false Elegy written in a country churchyard 1847 . The Etching Club. Etched thoughts 1844 The Etching Club. Etchings For The Art Union Of London by The Etching Club London Art Union of London, 1857 . The Etching Club. A selection of etchings by the etchings club Joseph Cundall, 1865 . References & Bibliography reflist Cope, H. W. http www.archive.org details reminiscencesofc00copeiala Reminiscences of Charles West Cope, R. A. London Bentley, 1891 p. 35 ff. Ray, Gordon Norton. The Illustrator ... of Illinois Press, 2001 p. 37 ff. Fredericksen, A. The Etching Club of London a taste for painters ... file& IXFILE templates full person.html&person 14559 The Etching Club . DEFAULTSORT Etching ... more details
Other uses Etching disambiguation Image Etched in Ferric Chloride at Home.jpg right thumb Etched in ferric chloride for PCB production at home Unreferenced date November 2008 In industry , etching , also known as chemical milling , is the process of using acid s, Base chemistry base s or other chemical s to dissolve unwanted materials such as metal s, semiconductor materials or glass. This process has been used on a wide variety of metals with depths of metal removal as large as 12mm 0.5 in . Selective attack by the chemical reagent on different areas of the workpiece surfaces is controlled by removable layers of material called masking or by partial immersion in the reagent. It has applications in the printed circuit board and semiconductor fabrication industries. It is also used in the aerospace industry to remove shallow layers of material from large aircraft components, missile skin panels, and extruded parts for airframes. History The process is known to have been used by craftsmen ... to apply the method to printmaking . Process Wet etching Residual stresses in the part are removed ... etching from taking place on these surfaces. Some masking types include tapes or paints which are referred ... etching can be removed by utilizing the scribe and peel technique. The exposed surfaces of the part ... etching by residual reagent. The etched part can be further machined by other finishing operations. Photochemical etching Main Photochemical machining This process is very similar to wet etching ... Stainless Steel 300 Series, 400 series Spring Steel Zinc Monel PH15 7 PH17 7 Alloy 42 Kovar Etching in the semiconductor industry Main Etching microfabrication Etching is used widely to manufacture ... techniques, the semiconductor industry commonly uses plasma etching . See also Etching art , for printmaking ... 6 processes photo etching Photo Etching process video References references DEFAULTSORT Industrial Etching Category Etching de tzen es Fresado qu mico eo Mordado fr Gravure industrielle ko ... more details
Image Wet etching tanks at LAAS 0465.jpg thumb 250px Etching tanks used to perform Piranha solution Piranha ... of systems LAAS technological facility in Toulouse, France. Etching is used in microfabrication to chemically remove layers from the surface of a wafer electronics wafer during manufacturing. Etching is a critically important process module, and every wafer undergoes many etching steps before ... material which resists etching. In some cases, the masking material is a photoresist which has been ... may be controlled approximately using the etching time and the known etch rate. More often, though, etching must entirely remove the top layer of a multilayer structure, without damaging the underlying or masking layers. The etching system s ability to do this depends on the ratio of etch rates ... anisotropic etch produces vertical sidewalls. Etching media and technology The two fundamental types ... varieties. Wet etching The first etching processes used liquid phase wet etchants. The wafer .... Wet etchants are usually isotropic, which leads to large bias when etching thick films. They also ... etching. As an alternative to immersion, single wafer machines use the Bernoulli principle to employ ... after wafer backgrinding , and very sensitive to thermal or mechanical stress. Etching a thin layer ... having dramatically increased strength and flexibility without breaking. Anisotropic wet etching Orientation dependent etching File Anisotropic wet etching.svg thumb An anisotropic wet etch on a silicon ... than does EDP. Etching a rectangular hole in a 100 Si wafer will result in a pyramid shaped etch pit. The wall will be flat and angled as opposed to curved in isotropic etching , and have an angle to the surface of the wafer of math tan 1 sqrt 2 54.7 circ math If the etching is stopped before ... A Water Amine Complexing Agent System for Etching Silicon journal Journal of the Electrochemical ... 522 ref 80 0.6 37 Si sub 3 sub N sub 4 sub , SiO sub 2 sub Plasma etching Modern Very large scale integration ... more details
Etching refers to the technique of creating art on the surface of glass by applying acidic, caustic, or abrasive substances. Traditionally this was done after the glass was blown or cast. Techniques File Bankfield Museum 053.jpg thumb left 1867 etched glass at Bankfield Museum In the 1920s a new mould etch process was invented, in which art was etched directly into the mould, so that each cast piece emerged from the mould with the image already on the surface of the glass. This reduced manufacturing costs and, combined with a wider use of colored glass, led to cheap glassware in the 1930s, which later became known as Depression glass. As the types of acids used in this process are extremely hazardous, abrasive methods have gained popularity. Typically, glass etching cream available from art supply stores consists of fluoride compounds, such as sodium fluoride and hydrogen fluoride very dangerous . The fluoridation of the glass which is a network covalent solid of silicon dioxide molecules causes the characteristic rough, opaque qualities of frosted glass. Abrasive sandblasting is also a common technique for creating patterns in glassware, creating a frosted look to the glass. High pressure air mixed with an abrasive material cuts away at the glass surface to create the effect. The longer the stream of air and abrasive material are focused in one spot, the deeper the cut will be. Sandblasting ... the more typical frosted etch that is produced by an abrasive etching technique, Leptat creates a deeply ... technique allows the glass to reflect light from many surfaces, like a jewel cut gem. Glass etching ... etching capablities,it is stored in plastic containers. References Unreferenced date February 2010 ... http www.glasspicture.narod.ru Site about etching glass as hobby http www.misterart.com store browse 003 cat id 232 Craft Supplies Glass Tile Art Glass Etching.htm Glass etching tools Glass forming glass art stub Category Glass art Category Etching ja zh ru ... more details
Plasma etching is a form of plasma processing used to fabricate integrated circuit s. It involves a high speed stream of glow discharge Plasma physics plasma of an appropriate gas mixture being shot in pulses at a sample. The plasma source, known as etch species, can be either charged ion s or neutral atom s and Radical chemistry radicals . During the process, the plasma will generate volatile etch products at room temperature from the chemical reaction s between the elements of the material etched and the reactive species generated by the plasma. Eventually the atoms of the shot element embed themselves at or just below the surface of the target, thus modifying the physical properties of the target. ref cite web url http www.oxinst.com products etching deposition growth processes techniques plasma etch Pages plasma etch.aspx title Plasma Etch Plasma Etching accessdate 2010 02 04 ref Plasma generation Plasma systems Ionization ionize a variety of source gases in a vacuum system by using RF excitations. The frequency of operation of the RF power source is frequently 13.56 MHz, chosen by the Federal Communications Commission FCC for industrial and scientific use. Nevertheless, it can be used at lower frequencies kilohertz or higher microwave . The mode of operation of the plasma system will change if the operating pressure changes. Also, it is different for different structures of the reaction chamber. In the simple case, the electrode structure is symmetrical, and the sample is placed upon the grounded electrode. Free radicals such as fluorine or chlorine are created in the plasma and react at the sample surface. Without the assistance of the plasma, much higher temperature would be required. The low processing temperature is possible because the plasma generates atom s, Radical chemistry molecular radicals and ion positive ions that are more chemically reactive than ... etching processes is to find the appropriate gas etch chemistry that will form volatile products ... more details
File Fat removal using cannula during tumescent liposuction.jpg thumb Fat removal using cannula Abdominal etching , or Ab etching , is a plastic surgery procedure invented by plastic surgeon Henry A. Mentz, III in the early 1990s that uses a special cannula to contour and shape abdominal fat pad to provide patients with a flatter stomach . The procedure selectively removes a small amount of fat around the patient s natural muscular contours and shapes or sculpts the abdomen to create a more athletic contour. ref http grande.nal.usda.gov ibids index.php?mode2 detail&origin ibids references&therow 549218 USDA Government Journal Reference ref Prior to the procedure, the surgeon makes detailed markings of the patient s flexed ab muscle s and uses the markings to remove fat and highlight the patient s individual muscular structure. The procedure is suitable for patients who are already in shape and who have between one to two centimeters of pinchable belly fat . It is not suitable for patients with larger accumulations of abdominal fat seeking to significantly reduce their belly size or accomplish weight reductions as the amount of fat removed is fairly small. A traditional liposuction is more suitable for those patients. ref Jacob Goldstein, http online.wsj.com article SB119431190803983349.html Six pack surgery From puffy to buff , Wall Street Journal , October 30, 2007 ref References div class references small reflist div External links http grande.nal.usda.gov ibids index.php?mode2 detail&origin ibids references&therow 549218 USDA Journal reference http www400.sos.louisiana.gov cgibin?rqstyp crpdtltsC&rqsdta 589485 Abdominal etching government trademark reference Category Plastic surgery Category Surgical procedures ... more details
Unreferenced date December 2009 The New York Etching Club was the first professional organization in America devoted to the medium of etching . Its founders were inspired by the Etching revival that had blossomed in France and England in the middle 19th century. The purpose of the club was to create and promote etchings that did not merely reproduce existing paintings, but were original creations of art in their own right. The first meeting of the New York Etching Club took place in the studio of James David Smillie on May 2, 1877. An etching by Robert Swain Gifford was printed on a small press under the supervision of Dr. Leroy Milton Yale . Eventually, bi monthly meetings moved to the studio of Henry Farrer where etchings were printed from a press that Farrer built. Other important members of the New York Etching Club included Charles Adams Platt , Thomas Moran , Mary Nimmo Moran , Samuel Colman , Kruseman Van Elten , William Merritt Chase , Frederick Stuart Church , Stephen Parrish , Joseph Pennell , and Thomas Waterman Wood . For most members, etching was an important side interest to their main occupation as painters. The New York Etching Club held regular exhibitions through the early 1890s in which members and invited guests displayed their etchings for sale to the general public. From 1879 to 1881, works by members of the New York Etching Club were also featured in a periodical called The American Art Review . Published under the leadership of Sylvester Rosa Koehler , the first curator of prints at the Museum of Fine Arts, Boston , it further popularized etching as a medium and the New York Etching Club as a professional organization. The success of the New York Etching Club helped spawn similar organizations in other major American cities in the late 19th century. Category Etching Category Organizations based in the United States ... more details
PUIresolved 2007 08 29 log log See Wikipedia Possibly unfree images 2007 July 17 Summary Etching on prison wall still visible today at the Breakwater Prison. Picture to be seen with article on Breakwater Lodge Licensing self GFDL cc by sa 2.5,2.0,1.0 migration relicense ... more details
Unreferenced date December 2009 Deep reactive ion etching DRIE is a highly anisotropic etching microfab etch process used to create deep, steep sided holes and trenches in wafer semiconductor wafer s, with aspect ratio image aspect ratio s of 20 1 or more. It was developed for microelectromechanical systems MEMS , which require these features, but is also used to excavate trenches for high density capacitor s for dynamic random access memory DRAM and more recently for creating through wafer via s TSV s in advanced 3D wafer level packaging technology . There are two main technologies for high rate DRIE cryogenic and Bosch, although the Bosch process is the only recognised production technique. Both Bosch and cryo processes can fabricate 90 truly vertical walls, but often the walls are slightly tapered, e.g. 88 or 92 retrograde . Another mechanism is sidewall passivation SiO sub x sub F sub y sub functional group s which originate from sulphur hexafluoride and oxygen etch gases condensate on the sidewalls, and protect them from lateral etching. As a combination of these processes deep vertical structures can be made. Cryogenic process In cryo DRIE, the wafer is chilled to 110 C 163 kelvin K . The low temperature slows down the chemical reaction that produces isotropic etching. However ... the Bosch process The Bosch process, also known as pulsed or time multiplexed etching, alternates ... chemical attack and prevents further etching. However, during the etching phase, the directional ion ... deep etching. Polysilicon and nickel are used for 10 50 m etched depths. In DRIE of polymers, Bosch process with alternating steps of SF sub 6 sub etching and C sub 4 sub F sub 8 sub passivation ... reactive ion etching Nanotechnology, 2009 . See also Reactive ion etching Microelectromechanical systems DEFAULTSORT Deep Reactive Ion Etching Category Semiconductor device fabrication Category Microtechnology Category Etching microfabrication de Reaktives Ionentiefen tzen fr Gravure ionique r active ... more details
image PDMS etching scheeme.jpg 200px right thumb Figure 1 Example of a procedure using ammonium fluoride as an etchant and polymer brush polymer brushes for visulaisation Patterning by Etching at the nanoscale PENs is a soft lithography soft lithographic technique in which the bonds in the PDMS matrix are broken to controlably etch PDMS ie dissolve at a slow rate along the outside of a PDMS channel formed with a patterned PDMS stamp applied to a surface. The channel in the stamp can be enlarged in the order of tens of nanometers to several micrometre s. Exposing a fresh area of a surface that can be reacted with. Summary PDMS contains polymer chains of silicon oxygen bonds, these bonds can be broken by fluoride containing species, in the same way that wafer electronics silicon wafers are prepared by etching with hydrofluoric acid , ammonium fluoride and related compounds. By placing a PDMS stamp that contains a channel that can be externally filled on to a surface, that surface can be functionalised in the area of the channel. By then running an etching solution through the channel, part of the PDMS will be removed. Exposing a fresh area of the surface. This can then be functionaliesd by appropriate chemistry. The width of feature produced is controlled by etchant and time. To apply this technique for the production of small patterned features it is necessary that the surface can be reacted to passivate it in the area exposed by the channel, followed by etching and then reacted in away that will only occur in the newly exposed area. References Perring M., Mitchell, M., Kenis P. J. A., Bowden N. B., Chem. Mat 2007 19 11 , 2903 Category Nanoelectronics ... more details
File Reactive Ion Etcher.JPG thumb A commercial reactive ion etching setup in a cleanroom Reactive ion etching RIE is an etching microfabrication etching technology used in microfabrication . It uses chemical reaction chemically reactive plasma physics plasma to remove material deposited on wafer electronics wafer s. The plasma is generated under low pressure vacuum by an electromagnetic field . High energy ion s from the plasma attack the wafer surface and react with it. Equipment A typical parallel plate RIE system consists of a cylindrical vacuum chamber, with a wafer electronics wafer platter situated in the bottom portion of the chamber. The wafer platter is electrically isolated from the rest of the chamber, which is usually ground electricity ground ed. Gas enters through small inlets in the top of the chamber, and exits to the vacuum pump system through the bottom. The types and amount of gas used vary depending upon the etch process for instance, sulfur hexafluoride is commonly used for etching silicon . Gas pressure is typically maintained in a range between a few milli torr and a few hundred millitorr by adjusting gas flow rates and or adjusting an exhaust orifice. Other types of RIE systems exist, including inductively coupled plasma ICP RIE. In this type of system, the plasma is generated with an RF powered magnetic field. Very high plasma densities can be achieved ... ions, reactive ion etching can produce very anisotropic etch profiles, which contrast with the typically isotropic profiles of Wet etching wet chemical etching . Etch conditions in an RIE system ... version of RIE is deep reactive ion etching , used to excavate deep features. See also Deep reactive ion etching Deep RIE Bosch Process Plasma Etcher External links http www.ee.byu.edu cleanroom rie etching.phtml BYU Cleanroom RIE Etching http www.oxfordplasma.de process sibo 1.htm Bosch Process ... Category Plasma processing Category Semiconductor device fabrication Category Etching microfabrication ... more details
Summary Information Description Etching of owner s house at Kingsley Plantation on Fort George Island Source http www.floridamemory.com PhotographicCollection Florida Memory Project Call No. PR10577 Date 1878 Author unknown Permission Public domain other versions Licensing PD old 100 ... more details
Summary Author Glassnote Subject etching by John Wilde Artist John Wilde printed by Warrington Colescott, Mantegna Press Title 7 Kiefers Medium Color etching on rag paper Rives BFK , Ed. 100 Licensing PD self date September 2009 ... more details
White Butterfly , 1912 etching by Roi George Partridge Fair use in Roi George Partridge Though this image is subject to copyright, its use is covered by the U.S. fair use laws because This is a historically significant work that could not be conveyed in words. Inclusion is for information, education, and analysis only. Its inclusion in the article s adds significantly to the article s because it shows a major type of work produced by the artist. The image is a low resolution copy of the original work and would be unlikely to impact sales of prints or be usable as a desktop backdrop. It is not replaceable with an uncopyrighted or freely copyrighted image of comparable educational value. BetacommandBot Exclude SieBot Exclude STBotI Exclude Non free 2D art ... more details
Against the Common Good II , etching and aquatint by Enrique Chagoya , 1983 Licensing Fair use rationale This is a historically significant work that could not be conveyed in words. Inclusion is for information, education and analysis only. Its inclusion in the article s adds significantly to the article s because it shows the subject, or the work of the subject, of the article s . The image is a low resolution copy of the original work and would be unlikely to impact sales of prints or be usable as a desktop backdrop. Non free 2D art ... more details
The Windshield Sam Francis , hand colored etching and aquatint by David Gilhooly , 2001 Licensing Fair use rationale This is a historically significant work that could not be conveyed in words. Inclusion is for information, education and analysis only. Its inclusion in the article s adds significantly to the article s because it shows the subject, or the work of the subject, of the article s . The image is a low resolution copy of the original work and would be unlikely to impact sales of prints or be usable as a desktop backdrop. Non free 2D art ... more details
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